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H2 Vacuum Plasma Chamber – Optimal Metal Oxide Removal Solution
In precision manufacturing industries such as electronics, semiconductors, and high-end mechanical engineering, removing microscopic oxide layers from metal surfaces is a critical requirement to ensure adhesion quality and product reliability. The H2 Vacuum Plasma Chamber is regarded as an advanced surface treatment solution that effectively removes metal oxides while safely preserving sensitive organic surface layers.
1. Introduction to the H2 Vacuum Plasma Chamber
The H2 Vacuum Plasma Chamber is a surface treatment technology that utilizes hydrogen gas (H₂) under low-pressure vacuum conditions. Unlike traditional chemical or mechanical cleaning methods, this system operates at the microscopic level, restoring clean and highly active metal surfaces without causing corrosion, deformation, or material damage.
This technology is particularly suitable for high-precision applications such as semiconductor manufacturing, electronic components, energy storage batteries, medical devices, and metal parts coated with thin organic layers.
2. Working principle – Oxide removal without surface damage
The core principle of the H2 Vacuum Plasma Chamber is the generation of hydrogen plasma inside a vacuum chamber using an RF power source. Highly reactive hydrogen ions and radicals (H*) then:
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Selectively react with metal oxides (such as CuO, NiO, Fe₂O₃)
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Reduce metal oxides into pure metal and volatile by-products (H₂O)
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Avoid damaging or breaking sensitive organic layers such as polymers, adhesives, or thin protective coatings
As a result, microscopic oxide layers are removed in a clean, uniform, and controlled manner—something many conventional methods cannot achieve.
3. Typical technical specifications
A standard H2 Vacuum Plasma Chamber typically includes the following specifications:
| Item | Specification | Item | Specification |
|---|---|---|---|
| Overall dimensions | 760W × 1435H × 757D (mm) | Processing chamber volume | 310W × 320H × 330D (mm) / 30 L |
| Effective processing area | 250W × 260D (mm) | Effective processing layers | 1 ~ 5 layers (standard: 3 layers) |
| Main power supply | 380V (±10%) AC, 50Hz ~ 60Hz | Plasma power source | RF 13.56 MHz (300 W) |
| Vacuum pumping system | Direct-drive rotary vane vacuum pump, dual-stage oil pump | Control method | PLC + HMI touchscreen (stores up to 50 recipes) |
| Operation mode | Automatic / manual (switchable) | ||
| Gas flow control | High-precision mass flow controller (0 ~ 300 ml/min) | Gas line system | Standard single gas line (O₂, N₂, Ar, CF₄, etc.) |
| Working vacuum level | 10 ~ 150 Pa | Equipment power consumption | ≤ 2 kW |
| Gas inlet pressure | O₂, N₂, Ar, CF₄: 0.4 ~ 0.5 MPa | ||
| Cooling gas (pure N₂) | 0.3 ~ 0.4 MPa | Compressed air (start valve) | ≥ 0.4 MPa |
| Cleaning cycle | < 5 minutes per cycle | ||
| Process steps | Vacuum pumping + plasma cleaning + venting | Notes | Actual time depends on product and process requirements |
4. Economic benefits of using the H2 Vacuum Plasma Chamber
Investing in an H2 Vacuum Plasma Chamber delivers significant economic advantages:
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Reduced chemical consumption with no hazardous wastewater generation
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Extended component lifespan due to clean and stable metal surfaces
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Higher yield rates and reduced production defects
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Labor savings through easy automation and standardized processes
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Compliance with strict environmental and export regulations
Conclusion
With its ability to efficiently remove microscopic metal oxide layers, safely protect sensitive organic surfaces, and optimize operating costs, the H2 Vacuum Plasma Chamber is an ideal solution for manufacturers pursuing precision, sustainability, and advanced production standards.
📞 Consultation & quotation – H2 Vacuum Plasma Chamber
Looking for a solution to remove metal oxides without damaging product surfaces?
Contact Ms. Yuna
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Hotline: +84 965 535 348
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Email: sales03@cousz.com
H2 Vacuum Plasma Chamber
Advanced H2 Vacuum Plasma Chamber for safe and efficient removal of metal oxides without damaging sensitive organic surface layers.
Product SKU: VACUUMH2E
Product Brand: COUSZ
Product Currency: VND
Product Price: 8888
Price Valid Until: 2025-12-31
Product In-Stock: InStock
admin –
Contact now for technical support!
Ms Yuna
📞 Hotline: +84 965 535 348
✉️ Email: sales03@cousz.com